Time-resolved evolution of plasma parameters in a plasma immersion ion implantation source

The origin and nature of perturbations induced by a high-voltage pulse on plasma parameters their relationship to operating conditions (power pressure) in an argon inductively coupled radio frequency device is explored. are measured with two compensated Langmuir probes positioned either vertically above the pulsing target or horizontally along diameter chamber, same axial plane as distance from RF antenna. Fluctuations observed electron density ne, temperature Te, potential Vpl following negative polarity high voltage pulses propagate deep well after end pulse. Time-resolved data results indicate that significantly dampened at higher power when closer coil. perturbation amplitudes depart steady state values amplitude exceeds 2.0 kV increase increasing amplitude. Perturbation also for materials having larger secondary yield. Our experimental suggest underlying mechanism this could be heating driven damping beam-plasma instability result beam electrons emitted streaming into plasma.